气压和偏流对高掺硼金刚石晶体性质的影响

贾福超; 白亦真; 屈 芳; 孙 剑; 赵纪军; 姜 辛

doi:10.1016/S1872-5805(09)60039-1

气压和偏流对高掺硼金刚石晶体性质的影响

doi: 10.1016/S1872-5805(09)60039-1

1.
大连理工大学物理与光电工程学院|辽宁大连 116023;
2.
大连理工大学三束材料改性教育部重点实验室|辽宁大连 116023;
3.
锡根大学材料工程研究所, 德国锡根保罗博纳茨街9-11,D-57076

基金项目: 科技部973计划（2008CB617614）.

详细信息

作者简介:
贾福超(1983-),男,山东泰安人|硕士研究生,主要从事超硬材料的研究. E-mail: fcjia515178@yahoo.cn

通讯作者:
白亦真,教授. Tel: +86-411-84706661-102, Fax:+86-411-84708389.

中图分类号: TQ 164 O 484. 4
计量
- 文章访问数: 2031
- HTML全文浏览量: 74
- PDF下载量: 1462
- 被引次数: 0
出版历程
- 收稿日期: 2009-12-09
- 录用日期: 2010-11-03
- 修回日期: 2010-08-05
- 刊出日期: 2010-10-15

The influence of gas pressure and bias current on the crystallinity of highly boron-doped diamond films

1.
School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, China|
2.
Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Ministry of Education,
3.
Dalian University of Technology, Dalian 116024, China|

Funds: The 973 Program (2008CB617614).

More Information

Author Bio:
JIA Fu-chao (1983-), male, Master, engaged in the study of superhard materials. E-mail:fcjia515178@yahoo.cn

Corresponding author: BAI Yi-zhen, Professor. Tel: +86-411-84706661-102, Fax: +86-411-84708389.

摘要

摘要: 采用热丝化学气相沉积法，改变工作气压和偏流，在硅基片上沉积了高掺硼金刚石膜。利用扫描电镜（SEM）、拉曼光谱和X射线衍射仪对沉积的金刚石膜表面形貌和结构进行表征。结果显示:当气体压强从3 kPa降低到1.5 kPa时，金刚石膜有较平的表面形貌和和较好的晶形，薄膜的晶体性质得到良好的改善。但是继续降气体压强，从1.5 kPa到 0.5 kPa时，却呈现出相反的趋势。固定气体压强（1.5 kPa），改变偏流，结果表明:适当的偏流（3 A）可以改善掺硼金刚石的质量，偏流较高会导致薄膜中非金刚石相增多。
- 高掺硼金刚石膜 /
- 气体压强 /
- 偏流 /
- 热灯丝化学气相沉积 /
- 扫描电镜 /
- X射线衍射仪 /
- 拉曼光谱
Abstract: Highly boron-doped diamond (BDD) films were deposited by hot filament chemical vapor deposition on a silicon substrate with different gas pressures and bias currents. The surface morphology and the structure of the diamond films were analyzed by scanning electron microscopy, Raman spectroscopy, and X-ray diffraction. Results indicated that the quality of the highly BDD films tended to be improved when the gas pressure decreased from 3 to 1. 5kPa, whereas they showed an opposite trend with a further decrease of the gas pressure from 1. 5 to 0. 5 kPa. An appropriate bias current (3A) was favorable in improving the qualities of the diamond films and a higher bias current led to an increase of the non-diamond phase in the films.
- Highly boron-doped diamond film /
- Gas pressures /
- Bias currents /
- HFCVD /
- SEM /
- XRD /
- Raman

HTML全文

参考文献(0)

施引文献

资源附件(0)

访问统计

点击查看大图

计量

文章访问数: 2031
HTML全文浏览量: 74
PDF下载量: 1462
被引次数: 0

姓名
邮箱
手机号码
标题
留言内容
验证码

留言板

气压和偏流对高掺硼金刚石晶体性质的影响

doi: 10.1016/S1872-5805(09)60039-1

作者简介:
贾福超(1983-),男,山东泰安人|硕士研究生,主要从事超硬材料的研究. E-mail: fcjia515178@yahoo.cn

通讯作者:
白亦真,教授. Tel: +86-411-84706661-102, Fax:+86-411-84708389.

计量

The influence of gas pressure and bias current on the crystallinity of highly boron-doped diamond films

Author Bio:
JIA Fu-chao (1983-), male, Master, engaged in the study of superhard materials. E-mail:fcjia515178@yahoo.cn

Corresponding author: BAI Yi-zhen, Professor. Tel: +86-411-84706661-102, Fax: +86-411-84708389.

计量

目录

留言板

气压和偏流对高掺硼金刚石晶体性质的影响

doi: 10.1016/S1872-5805(09)60039-1

作者简介: 贾福超(1983-),男,山东泰安人|硕士研究生,主要从事超硬材料的研究. E-mail: fcjia515178@yahoo.cn

通讯作者: 白亦真,教授. Tel: +86-411-84706661-102, Fax:+86-411-84708389.

计量

出版历程

The influence of gas pressure and bias current on the crystallinity of highly boron-doped diamond films

Author Bio: JIA Fu-chao (1983-), male, Master, engaged in the study of superhard materials. E-mail:fcjia515178@yahoo.cn

Corresponding author: BAI Yi-zhen, Professor. Tel: +86-411-84706661-102, Fax: +86-411-84708389.

计量

出版历程

目录

作者简介:
贾福超(1983-),男,山东泰安人|硕士研究生,主要从事超硬材料的研究. E-mail: fcjia515178@yahoo.cn

通讯作者:
白亦真,教授. Tel: +86-411-84706661-102, Fax:+86-411-84708389.

Author Bio:
JIA Fu-chao (1983-), male, Master, engaged in the study of superhard materials. E-mail:fcjia515178@yahoo.cn