李静, 祁奕铨, 赵诗翔, 邱汉迅, 杨俊和, 杨光智. 基于还原氧化石墨烯与碳化硅的多孔电磁屏蔽薄膜及其多层结构[J]. 新型炭材料. DOI: 10.1016/S1872-5805(24)60855-3
引用本文: 李静, 祁奕铨, 赵诗翔, 邱汉迅, 杨俊和, 杨光智. 基于还原氧化石墨烯与碳化硅的多孔电磁屏蔽薄膜及其多层结构[J]. 新型炭材料. DOI: 10.1016/S1872-5805(24)60855-3
LI Jing, Qi Yi-quan, ZHAO Shi-xiang, QIU Han-xun, YANG Jun-he, YANG Guang-zhi. RGO@SiC porous films based multilayer electromagnetic shields[J]. New Carbon Mater.. DOI: 10.1016/S1872-5805(24)60855-3
Citation: LI Jing, Qi Yi-quan, ZHAO Shi-xiang, QIU Han-xun, YANG Jun-he, YANG Guang-zhi. RGO@SiC porous films based multilayer electromagnetic shields[J]. New Carbon Mater.. DOI: 10.1016/S1872-5805(24)60855-3

基于还原氧化石墨烯与碳化硅的多孔电磁屏蔽薄膜及其多层结构

RGO@SiC porous films based multilayer electromagnetic shields

  • 摘要: 轻质柔性的电磁屏蔽薄膜材料的开发具有重要的意义。本文报道了一种还原氧化石墨烯与碳化硅(RGO@SiC)的多孔状电磁屏蔽薄膜,其多孔结构由3秒钟固态微波处理高效获得,该处理能高效还原氧化石墨烯,同时使薄膜厚度从大约20微米增加至200微米。当该薄膜的电磁屏蔽效能达到35.6dB时,其反射效能仅为 2.8 dB。SiC晶须在薄膜中的添加有利于电磁波的多次反射、界面极化和介电衰减。进一步,将RGO@SiC多孔薄膜按照透过层到反射层的顺序叠加,构建多层复合薄膜,并采用多壁碳纳米管纸作为反射层。当多层结构厚度为1.5毫米时,最高电磁屏蔽效能达到75.1 dB,其中反射效能仍保持在2.7 dB。我们相信该多孔状RGO@SiC 薄膜可用于设计以吸收为主的电磁屏蔽多层封装材料或三明治结构的芯层。

     

    Abstract: Development of lightweight and flexible thin films for electromagnetic interference (EMI) shielding is of great significance. In this paper, RGO@SiC porous thin films were prepared for EMI shielding. The porous structure was easily obtained by 3 s of solid phase microwave irradiation, which resulted in an efficient reduction of GO and a significant increase of the film thickness from around 20 to 200 μm. The SET of the RGO@SiC porous thin film reached 35.6 dB, while the SER was only 2.8 dB. The addition of SiC whiskers was critical for the multi-reflection, interfacial polarization and dielectric attenuation of EM waves. Further, the multilayer composites with a gradient change from transmission to reflection were constructed by stacking the RGO@SiC porous films and using multi-walled carbon nanotubes buckypaper as the reflection layer. The highest SET reached 75.1 dB with a SER value of 2.7 dB and a thickness of about 1.5 mm. We believe the porous RGO@SiC thin films were promising for designing multilayer or sandwich structure as EMI absorption packaging or lining materials.

     

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