Bohr-Ran Huang, Chun-Shin Yeh, Dau-Chung Wang, J.T.Tan| J. Sung, . Field emission studies of amorphous carbon deposited on copper nanowires grown by cathodic arc plasma deposition[J]. New Carbon Mater., 2009, 24(02): 97-101. DOI: 10.1016/S1872-5805(08)60040-2
Citation: Bohr-Ran Huang, Chun-Shin Yeh, Dau-Chung Wang, J.T.Tan| J. Sung, . Field emission studies of amorphous carbon deposited on copper nanowires grown by cathodic arc plasma deposition[J]. New Carbon Mater., 2009, 24(02): 97-101. DOI: 10.1016/S1872-5805(08)60040-2

Field emission studies of amorphous carbon deposited on copper nanowires grown by cathodic arc plasma deposition

  • The field emission properties of amorphous carbon/copper nanowire (CuNW)/Si composites have been investigated. The CuNWs (50-80nm in diameters) were deposited anodically within the pores of a porous anodic aluminum oxide (AAO) nano-template by electrolysis of a CuSO4-H2SO4 solution at room temperature using DC current. Two kinds of structure, amorphous carbon/Si and amorphous carbon/CuNWs/Si , were used. Both of them can emit electrons in vacuum towards an anode at a very low turnon field. Field emission from the amorphous carbon/CuNWs/Si shows a fourfold decrease in turn-on field compared with the amorphous carbon/Si. Results indicated that the electrons were emitted under the effect of an enhanced field because of the geometry of the amorphous carbon sample.
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